Coating process mask

Coating processes – Coating by vapor – gas – or smoke – Organic coating applied by vapor – gas – or smoke

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427 99, 427255, 427259, 427282, 427336, 427416, C23C 1300

Patent

active

042998662

ABSTRACT:
This invention describes a method of masking a workpiece to prevent the adhesion of a deposited tightly adhering conformal coating formed from the condensation of a vaporous diradical such as paraxylylene on selected portions of the workpiece. Specifically the process of the invention requires the covering of the areas of the workpiece, to which adhesion is not desired, with a non-polymerizing hydrocarbon and placing the covered area in close contact with an open cellular material containing a predominance of interconnecting cells which provides a large surface area for condensation of the unwanted condensate of the diradical, exposing the workpiece to the vaporous diradical, removing the workpiece from the open cellular material and immersing the workpiece in a solvent for swelling and dissolving the hydrocarbon covering.

REFERENCES:
patent: 2991188 (1961-07-01), Wing et al.
patent: 3055777 (1962-09-01), Grad
patent: 3309227 (1967-03-01), McTeague
patent: 3892892 (1975-07-01), Hofer
patent: 3895135 (1975-07-01), Hofer
patent: 3900600 (1975-08-01), Spaulding
patent: 3928661 (1975-12-01), Higbee et al.
patent: 4127680 (1978-11-01), Shirn et al.
IBM Technical Disclosure Bulletin, "Protecting Module Pins from Resin Contamination", Nov. 1970, vol. 13, #6, p. 1608.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coating process mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating process mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating process mask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2362786

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.