Coating porous materials with metal oxides and other ceramics by

Details Coating porous materials with metal oxides and other ceramics by Coating porous materials with metal oxides and other ceramics by

1992-04-17

1993-11-16

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

427244, 4272554, 4272557, 4273762, 427399, C23C 1600, B05D 500

Patent

active

052621995

ABSTRACT:
Metal organic chemical vapor deposition (MOCVD) is used to form a layer of a metal oxide on the surfaces and within the pores of a porous ceramic material. The metal oxide is formed from one or more inexpensive metal organic precursors which permeate the pores of the substrate as a vapor. Surface reactions on the heated substrate convert the metal organic precursors to their metal oxide. The technique has particular utility in creating catalysts with very large surface areas and in providing a protective coating on ceramic materials that prevents or reduces damage from hostile environments. In a preferred embodiment, aluminum isopropoxide, [(CH.sub.3).sub.2 CHO].sub.3 Al, and titanium ethoxide, Ti(C.sub.2 H.sub.5 O).sub.4, are used simultaneously or successively as precursors to generate a Al.sub.2 TiO.sub.5 coating on a porous ceramic substrate such as SiC or porous refractory cement candle filters.

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patent: 5087277 (1992-02-01), Gonzalez et al.
Seshu B. Desu, Decomposition Chemistry of Tetraethoxysilane, J. Am. Ceram. Soc., 72(9) 1615-21 (1989). (no month available).

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