Coating method of forming orientation film of predetermined...

Liquid crystal cells – elements and systems – Nominal manufacturing methods or post manufacturing...

Reexamination Certificate

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C349S123000, C349S124000, C427S096400

Reexamination Certificate

active

06842216

ABSTRACT:
The present invention discloses a method of forming an orientation film on a substrate, including: providing the substrate on a stage; positioning a slit coater having a slit nozzle on the substrate; and spraying an orientation material on the substrate through the slit nozzle of the slit coater.

REFERENCES:
patent: 5046822 (1991-09-01), Matsuda et al.
patent: 5538754 (1996-07-01), Sandock
patent: 5879851 (1999-03-01), Takahashi et al.
patent: 6261856 (2001-07-01), Shinohara et al.
patent: 6436472 (2002-08-01), Sago et al.
Slitcoater Model CFPR R-119S visual presentation materials from Tokyo Ohka Kegyo Co., Ltd., Coater Development Section Equipment Development Division, Sep. 1996.*
Slitercoater Model CFPR R-119S visual presentation materials from Tokyo Ohka Kogyo Co., Ltd., Coater Development Section Equipment Development Division, Sep. 1997.

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