Coating liquid for formation of protective film for...

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Reexamination Certificate

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Reexamination Certificate

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07998567

ABSTRACT:
Disclosed is a coating liquid for forming a protective film having high film strength and a low specific dielectric constant for semiconductor processing, and a method for preparing the coating liquid. The coating liquid is a liquid composition comprising (a) silicon compound obtained by hydrolyzing tetraalkyl orthosilicate (TAOS) and alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) and water, or a silicon compound obtained by hydrolyzing or partially hydrolyzing tetraalkyl orthosilicate (TAOS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) and water, mixing the hydrolyzed or partially hydrolyzed product with alkoxysilane (AS) or a hydrolyzed or partially hydrolyzed product thereof, and hydrolyzing all or a portion of the mixture, (b) an organic solvent, and (c) water. The coating liquid is characterized in that a quantity of water contained in the liquid composition is in the range from 35 to 65% by weight.

REFERENCES:
patent: 6261357 (2001-07-01), Egami et al.
patent: 6406794 (2002-06-01), Shiota et al.
patent: 2003/0109633 (2003-06-01), Kobayashi et al.
patent: 2004/0110379 (2004-06-01), Yoshioka et al.
patent: 2004/0110896 (2004-06-01), Yoshioka et al.
patent: 2006/0009575 (2006-01-01), Nakashima
patent: 2006/0084277 (2006-04-01), Nakashima et al.
patent: 2003-41191 (2003-02-01), None
patent: 2003-171616 (2003-02-01), None
patent: 2003041191 (2003-02-01), None
patent: 2004-277463 (2004-10-01), None
patent: 2005-327757 (2005-11-01), None

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