Coating processes – Direct application of electrical – magnetic – wave – or... – Electromagnetic or particulate radiation utilized
Reexamination Certificate
2011-06-14
2011-06-14
Decady, Albert (Department: 2121)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electromagnetic or particulate radiation utilized
C700S207000, C118S712000
Reexamination Certificate
active
07959988
ABSTRACT:
A coating film forming apparatus includes a process section including one or more coating units and one or more thermally processing units; a pre-coating cleaning unit configured to perform cleaning on a back surface and an edge portion of a substrate; and a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate. A control section is configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a state of particles on a back surface and an edge portion of the substrate is within an acceptable range, and permitting transfer of the substrate into the process section where the state of particles is within the acceptable range.
REFERENCES:
patent: 2006/0231206 (2006-10-01), Nagasaka et al.
patent: 2007/0052939 (2007-03-01), Ishii et al.
patent: 2007/0092807 (2007-04-01), Fukushima et al.
patent: 9-275090 (1997-10-01), None
patent: 2000-88763 (2000-03-01), None
patent: 2001-195731 (2001-07-01), None
patent: 2003-31542 (2003-01-01), None
patent: 3811376 (2006-06-01), None
patent: 2005/029559 (2005-03-01), None
Fujimoto Akihiro
Kitano Junichi
Kyouda Hideharu
Miyahara Osamu
Takiguchi Yasushi
De'cady Albert
Gami Tejal J
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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