Coating equipment

Details Coating equipment Coating equipment

1991-06-10

1992-09-01

Koag, Willard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118 52, 118 64, 118319, 118326, 118630, B05B 1504, B05B 1502

Patent

active

051435527

ABSTRACT:
Coating equipment, which is installed in a clean room where air flows in a vertical laminar flow, comprises coating apparatus, for applying a resist, having a spin chuck connected to a motor and used to hold a semiconductor wafer and a cup with an inlet port to draw in a vertical laminar flow from the clean room and enclosing the wafer held on the spin chuck, and a control apparatus to control the temperature and humidity of the vertical laminar flow supplied to the coating apparatus. A vertical laminar flow control in temperature and humidity by the control apparatus is always supplied to the wafer in the cup during the coating process of a semiconductor wafer.

REFERENCES:
patent: 2386591 (1945-10-01), Campbell
patent: 3352280 (1967-11-01), Hughes et al.
patent: 3537425 (1970-11-01), David
patent: 4564280 (1986-01-01), Fukuda
patent: 4895102 (1990-01-01), Kachel et al.

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