Coating device with movable fluid supply nozzle and rotatable su

Details Coating device with movable fluid supply nozzle and rotatable su Coating device with movable fluid supply nozzle and rotatable su

1997-06-16

1998-07-21

Czaja, Donald E.

Coating apparatus

Projection or spray type

Rotating work

118319, 118320, B05C 500, B05C 1108

Patent

active

057829780

ABSTRACT:
A fluid application apparatus of the present invention includes a rotatable substrate holding mechanism (4), a photoresist liquid supply portion (5) and a motor mechanism (26). The photoresist liquid supply portion (5) supplies resist fluid to a region smaller than the entire region of the substrate surface while moving in the horizontal direction relative to the substrate holding mechanism (4). The motor mechanism (26) rotates the substrate holding mechanism (4) to diffuse the resist fluid over the entire surface of the substrate and form a resist layer having a predetermined thickness.

REFERENCES:
patent: 4267212 (1981-05-01), Sakawaki
patent: 4451507 (1984-05-01), Beltz et al.
patent: 5156681 (1992-10-01), Harlan
patent: 5215622 (1993-06-01), Schmeizer
patent: 5234499 (1993-08-01), Sasaki et al.
patent: 5250116 (1993-10-01), Tanimoto
patent: 5252137 (1993-10-01), Tayeyama et al.
patent: 5374312 (1994-12-01), Hasebe et al.

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