Coating/developing apparatus and pattern forming method

Details Coating/developing apparatus and pattern forming method Coating/developing apparatus and pattern forming method

2011-04-12

2011-04-12

Mathews, Alan A (Department: 2882)

Photocopying

Projection printing and copying cameras

With developing

C355S030000, C396S611000

Reexamination Certificate

active

07924396

ABSTRACT:
A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.

REFERENCES:
patent: 6585430 (2003-07-01), Matsuyama et al.
patent: 2006/0159449 (2006-07-01), Yasuda et al.
patent: 7-263402 (1995-10-01), None
patent: 2000-58498 (2000-02-01), None
patent: 2001-319857 (2001-11-01), None
English Translation of JP 2000-058498 (dated Feb. 25, 2000).
English Translation of JP 07-263402 (dated Oct. 13, 1995).

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