Coating compositions for use with an overcoated photoresist

Stock material or miscellaneous articles – Composite – Of polyester

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S271100, C430S325000, C430S523000, C430S531000, C430S533000, C524S284000, C524S315000

Reexamination Certificate

active

10844125

ABSTRACT:
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.

REFERENCES:
patent: 5128230 (1992-07-01), Templeton et al.
patent: 5525457 (1996-06-01), Nemoto et al.
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5935760 (1999-08-01), Shao et al.
patent: 5939236 (1999-08-01), Pavelchek et al.
patent: 6033830 (2000-03-01), Sinta et al.
patent: 6042990 (2000-03-01), Shao et al.
patent: 6048662 (2000-04-01), Bruhnke et al.
patent: 6080530 (2000-06-01), Shao et al.
patent: 6117618 (2000-09-01), Yedur et al.
patent: 6156479 (2000-12-01), Meador et al.
patent: 6190839 (2001-02-01), Pavelchek et al.
patent: 6255405 (2001-07-01), Kang et al.
patent: 6261743 (2001-07-01), Pavelchek et al.
patent: 6316160 (2001-11-01), Shao et al.
patent: 6316165 (2001-11-01), Pavelchek et al.
patent: 6323310 (2001-11-01), Puligadda et al.
patent: 6410209 (2002-06-01), Adams et al.
patent: 6444320 (2002-09-01), Takei et al.
patent: 6503689 (2003-01-01), Zampini et al.
patent: 6524708 (2003-02-01), Puligadda et al.
patent: 6528235 (2003-03-01), Thackeray et al.
patent: 6576681 (2003-06-01), Zampini et al.
patent: 6586152 (2003-07-01), Urano et al.
patent: 6599951 (2003-07-01), Zampini et al.
patent: 6602652 (2003-08-01), Adams et al.
patent: 6653049 (2003-11-01), Pavelchek et al.
patent: 6852421 (2005-02-01), Wayton et al.
patent: 6908724 (2005-06-01), Araki et al.
patent: 2002/0022196 (2002-02-01), Pavelchek et al.
patent: 2002/0028408 (2002-03-01), Mao et al.
patent: 2002/0031729 (2002-03-01), Trefonas, III et al.
patent: 2002/0045125 (2002-04-01), Shao et al.
patent: 2003/0065164 (2003-04-01), Puligadda et al.
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2003/0129542 (2003-07-01), Shih et al.
patent: 2003/0180559 (2003-09-01), Wayton et al.
patent: 2004/0067437 (2004-04-01), Wayton et al.
patent: 0 698 823 (1996-02-01), None
patent: 0 803 777 (1997-10-01), None
patent: WO 99/21058 (1999-04-01), None
patent: WO 99/56178 (1999-11-01), None
patent: WO 02/086624 (2002-10-01), None
Yu et al.; “Development of a Bond Contribution Model for Structure:Property Correlations in Dry Etch Studies Photoresist Bottom ARCs”; Proceedings of the SPIE; vol. 4345, Feb. 26, 2001-Jan. 28, 2001; pp. 945-951, XP002269115; USSPIE, Bellingham, VA.
Meador et al.; “Improved Crosslinkable Polymeric Binders for 193nm Bottom Antireflective Coatings (BARCs)”; Proceedings of the SPIE, vol. 4345, Feb. 26-28, 2001, pp. 846-854, XP002269118; USSPIE, Bellingham, VA.
Deshpande et al.; “Novel Conformal Organic Anti-Reflective Coatings for Advanced I-Line Lithography”; Proceedings of the SPIE, vol. 4345, Feb. 26-28, 2001, pp. 855-863, CP002269117, USSPIE, Bellingham, VA.
Kishioka et al.; “Development of 193nm Organic BARC”; Proceedings of the SPIE, vol. 4345, Feb. 26-28, 2001, pp. 816-820, XP002269116, USSPIE, Bellingham, VA.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coating compositions for use with an overcoated photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating compositions for use with an overcoated photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating compositions for use with an overcoated photoresist will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3740402

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.