Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1996-09-11
1998-07-28
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430215, 430263, 430536, 430627, 430961, 430935, 428500, 428522, G03C 176, G03C 189, G03C 193, G03C 852
Patent
active
057861358
ABSTRACT:
The present invention describes an imaging element wherein one layer is coated from an aqueous coating solution having a film forming binder. The film forming binder includes a carboxylic acid containing vinyl polymer or copolymer having a glass transition temperature greater than 60.degree. C. and an acid number of from 60 to 260. The carboxylic acid groups of the vinyl polymer or copolymer are reacted with ammonia or amine to provide a pH of the coating composition of from about 7 to 10.
REFERENCES:
patent: 3895949 (1975-07-01), Akamatsu et al.
patent: 4497917 (1985-02-01), Upson et al.
patent: 4612279 (1986-09-01), Stekenski et al.
patent: 4629677 (1986-12-01), Katoh
patent: 4677050 (1987-06-01), Yokoyama et al.
patent: 4954559 (1990-09-01), Den Hartog
patent: 5166254 (1992-11-01), Nickle et al.
patent: 5204404 (1993-04-01), Werner et al.
patent: 5219916 (1993-06-01), Den Hartog
patent: 5314945 (1994-05-01), Nickle et al.
patent: 5447832 (1995-09-01), Wang et al.
Journal of Applied Polymer Science, vol. 39, pp. 2119-2128, 1990.
Anderson Charles Chester
Bello James L.
DeLaura Mario D.
Wang Yongcai
Eastman Kodak Company
Ruoff Carl F.
Schilling Richard L.
LandOfFree
Coating composition for imaging elements does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Coating composition for imaging elements, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating composition for imaging elements will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-22006