Coating chamber, accompanying substrate carrier, vacuum evaporat

Details Coating chamber, accompanying substrate carrier, vacuum evaporat Coating chamber, accompanying substrate carrier, vacuum evaporat

1996-01-17

1998-04-14

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

118728, 118729, 118730, 118500, C23C 1400

Patent

active

057387290

ABSTRACT:
In order to maintain a required minimal variation of angle of incidence (a) of a coating material on a flat substrate (3), it is recommended that the substrate (3) be exposed to the evaporation source (1) clamped in a curved position.

REFERENCES:
patent: 3253945 (1966-05-01), Cauley
patent: 3362848 (1968-01-01), Hamilton
patent: 3660146 (1972-05-01), Chadsey
patent: 3683847 (1972-08-01), Carleton
patent: 3850138 (1974-11-01), Patono
patent: 4979468 (1990-12-01), Kleyer
patent: 5122389 (1992-06-01), Yasunaga
patent: 5216742 (1993-06-01), Krug
patent: 5272298 (1993-12-01), Taguchi

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