Coating apparatus for segments of cylindrical substrates

Coating apparatus – With vacuum or fluid pressure chamber

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S715000, C118SDIG010, C427S181000, C427S238000, C427S294000

Reexamination Certificate

active

10907217

ABSTRACT:
A coating apparatus includes a cylindrical holding chamber having open ends, an opening formed in an inner surface and an inner diameter; a specimen having a curved inner surface with a radius of curvature that is equal to one half the inner diameter of the cylindrical holding chamber, the specimen having a size such that, when inserted in the opening in the inner surface of the cylindrical holding chamber, the inner surface of the cylindrical holding chamber and the curved inner surface of the specimen form a continuous surface; a counter bore formed radially outward from the opening in the inner wall of the cylindrical holding chamber; at least one evacuation hole extending from an interior of the cylindrical holding chamber through a wall of the cylindrical holding chamber to the counter bore; a flat formed on an exterior surface of the cylindrical holding chamber around the counter bore; and fastener holes formed around the counter bore and extending from the flat into the wall of the cylindrical holding chamber.

REFERENCES:
patent: 3915118 (1975-10-01), Koch et al.
patent: 5521351 (1996-05-01), Mahoney
patent: 6926923 (2005-08-01), Nakashima et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coating apparatus for segments of cylindrical substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating apparatus for segments of cylindrical substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating apparatus for segments of cylindrical substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3865130

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.