Coating apparatus, coating method and coating-film forming...

Details Coating apparatus, coating method and coating-film forming... Coating apparatus, coating method and coating-film forming...

2005-11-29

2009-11-03

Edwards, Laura (Department: 1792)

Coating apparatus

With means to centrifuge work

C118S056000, C118S319000, C118S320000, C118S323000, C134S902000, C901S043000

Reexamination Certificate

active

07611581

ABSTRACT:
A coating apparatus is provided in which a coating liquid supplied onto a surface of a substrate such as a semiconductor wafer and a glass substrate can be easily leveled so as to have a uniform thickness without any edge bead. The coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.

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patent: 2003-245591 (2003-09-01), None
patent: 2004--209340 (2004-07-01), None

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