Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-06-16
1993-12-28
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429809, 20429811, 20429828, 118500, C23C 1434
Patent
active
052736369
ABSTRACT:
A substrate table (4) is fixed to a rotatably mounted hollow shaft (3) in a vacuum coating tank (1). The shaft (3) has a first portion passing sealingly through a wall of the tank and a second portion which has a larger diameter than the first portion in the tank. The first portion has axial supply passages connected to a chamber in the second portion where electrical connectors and coolant distribution means are housed.
REFERENCES:
patent: 4230915 (1980-03-01), Zajac
patent: 4439261 (1984-02-01), Pavone et al.
patent: 4851101 (1989-07-01), Hutchinson
patent: 4869801 (1989-09-01), Helms et al.
patent: 4944860 (1990-07-01), Bramhall et al.
Leybold Aktiengesellschaft
Nguyen Nam
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