Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-05-15
1991-05-07
Nguyen, Nam X.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419231, C23C 1422
Patent
active
050134191
ABSTRACT:
An apparatus for coating by sputter ion plating comprises a chamber having a gas inlet and outlet for passing gas under low pressure continuously therethrough; a cathode fabricated of coating material or precursor therefor positioned in the chamber; and means for generating a glow discharge within the chamber to sputter cathode material to form a coating thereof or of a product obtained therefrom on a substrate also positioned in the chamber.
The cathode includes a plurality of projections (e.g. fins) extending from a surface, their disposition and geometry being such as to increase the effective ion current density in the chamber. In this way, high currents at low voltages and pressures may be achieved so that the apparatus can be used to coat a large substrate load, possibly at a higher coating rate.
REFERENCES:
patent: 3926147 (1975-12-01), Steube
patent: 3979273 (1976-09-01), Panzera et al.
patent: 4026787 (1977-05-01), Kuehnle
patent: 4151064 (1979-04-01), Kuehnle
patent: 4252626 (1981-02-01), Wright et al.
patent: 4401546 (1983-08-01), Nakamura et al.
patent: 4411763 (1983-10-01), Itaba et al.
patent: 4478703 (1984-10-01), Edamura et al.
Coad Joseph P.
Nelson Richard S.
Rickerby David S.
Whitmell Derek S.
Hinds William R.
Nguyen Nam X.
United Kingdom Atomic Energy Authority
LandOfFree
Coating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Coating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-937672