Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
2007-12-03
2009-10-06
Mathews, Alan A (Department: 2851)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C355S027000, C118S052000, C700S121000
Reexamination Certificate
active
07597492
ABSTRACT:
A buffer module is installed in a coating film forming unit block of a coating and developing system to reduce the number of interface arms needed by an interface block, and the manufacturing cost and footprint of the coating and developing system. For example, buffer modules BF31to BF34capable of holding a number of wafers W greater by one than the number of coating modules COT1to COT3of a COT layer B3is installed in the COT layer B3, In the COT layer B3, a wafer W is carried along a carrying route passing a temperature control module CPL3, COT1to COT3, a heating and cooling module LHP3, and the buffer modules BF31to BF34. A main arm A3carries wafers W such that the number of wafers W placed in the modules on the downstream side of the CPL3is greater by one than the number of modules between the CPL3and the buffer module when a processing rate at which an exposure system processes wafers W is lower that at which the COT layer B3processes wafers W.
REFERENCES:
patent: 7262829 (2007-08-01), Hayashida et al.
patent: 7322756 (2008-01-01), Akimoto et al.
patent: 7379785 (2008-05-01), Higashi et al.
patent: 2005/0287821 (2005-12-01), Higashi et al.
patent: 2006/0130750 (2006-06-01), Ishikawa et al.
patent: 2006/0165408 (2006-07-01), Akimoto et al.
patent: 2006/0183340 (2006-08-01), Hayashida et al.
patent: 2006/0203075 (2006-09-01), Vazac et al.
patent: 2004-193597 (2004-07-01), None
patent: 2006-203075 (2006-08-01), None
patent: 2006-222398 (2006-08-01), None
Hara Yoshitaka
Hayashida Yasushi
Mathews Alan A
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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