Coating and developing system and coating and developing method

Details Coating and developing system and coating and developing method Coating and developing system and coating and developing method

2007-10-16

2007-10-16

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000, C118S052000, C118S054000

Reexamination Certificate

active

11335635

ABSTRACT:
A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.

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