Coating and developing system and coating and developing method

Details Coating and developing system and coating and developing method Coating and developing system and coating and developing method

2007-09-11

2007-09-11

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000, C118S052000, C118S066000, C118S069000, C430S327000, C430S331000, C427S240000

Reexamination Certificate

active

11117552

ABSTRACT:
A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B3, a COT layer B4and a BCT layer B5, and developing unit blocks: DEV layers B1and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4and the BCT layer B5are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.

REFERENCES:
patent: 3337677 (2002-08-01), None
patent: 2004-193597 (2004-07-01), None

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