Coating and developing apparatus, coating and developing...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C427S096100, C438S584000, C438S758000

Reexamination Certificate

active

07809460

ABSTRACT:
A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried out from the exposing apparatus after the dipping exposure process to the washing section. The first substrate carrying means is controlled by a control means. Namely, the control means controls the first substrate carrying means such that the substrate can be washed in the washing section in a period of time prior to a time zone in which the size of liquid drops remaining on the substrate due to the dipping exposure process becomes smaller quite rapidly, based on a carrying-out ready signal for the substrate from the exposing apparatus, by using a relationship between the time elapsed from the end of the dipping exposure process and the size of liquid drops remaining on the substrate due to the dipping exposure process.

REFERENCES:
patent: 2006/0081461 (2006-04-01), Jomen et al.
patent: 2008/0137056 (2008-06-01), Fujiwara et al.
patent: 2008/0274433 (2008-11-01), Takaki et al.
patent: 06029270 (1994-02-01), None
patent: 10189412 (1998-07-01), None
patent: 2004-193597 (2004-07-01), None
patent: 2005-175079 (2005-06-01), None

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