Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-12-08
2010-10-05
Barnes-Bullock, Crystal J (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C427S096100, C438S584000, C438S758000
Reexamination Certificate
active
07809460
ABSTRACT:
A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried out from the exposing apparatus after the dipping exposure process to the washing section. The first substrate carrying means is controlled by a control means. Namely, the control means controls the first substrate carrying means such that the substrate can be washed in the washing section in a period of time prior to a time zone in which the size of liquid drops remaining on the substrate due to the dipping exposure process becomes smaller quite rapidly, based on a carrying-out ready signal for the substrate from the exposing apparatus, by using a relationship between the time elapsed from the end of the dipping exposure process and the size of liquid drops remaining on the substrate due to the dipping exposure process.
REFERENCES:
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patent: 2008/0274433 (2008-11-01), Takaki et al.
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Ishida Seiki
Yamamoto Taro
Barnes-Bullock Crystal J
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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