Coating and developing apparatus, and coating and developing...

Details Coating and developing apparatus, and coating and developing... Coating and developing apparatus, and coating and developing...

2006-09-19

2010-02-16

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S027000, C118S052000, C118S066000

Reexamination Certificate

active

07661894

ABSTRACT:
A processing block S2includes unit blocks, a BCT layer B3, COT layer B4and TCT layer B5, for forming coating films, and further includes DEV layers B1, B2layered with the unit blocks B3, B4, B5and used as unit blocks for a developing process. Beside the unit blocks B1to B5, a group G of transfer sections comprising transfer sections adapted to transfer each wafer W with each main arm A1to A5of the unit block B1to B5and hydrophobicity rendering units adapted to provide a hydrophobicity rendering process to the wafer W is provided. The wafer W is transferred by a transfer arm D between the transfer sections and the hydrophobicity rendering units. In this case, since it is not necessary to transfer the wafer W to the hydrophobicity rendering unit by using, for example, a main arm A4of a COT layer B4, the load on the arm A4can be reduced, thereby enhancing the carrying throughput.

REFERENCES:
patent: 6454472 (2002-09-01), Kim et al.
patent: 7379785 (2008-05-01), Higashi et al.
patent: 2003/0012575 (2003-01-01), Ueda et al.
patent: 2003/0133086 (2003-07-01), Senba et al.
patent: 2006/0162646 (2006-07-01), Akimoto et al.
patent: 2006/0201615 (2006-09-01), Matsuoka et al.
patent: 3337677 (2002-08-01), None
patent: 2004-193597 (2004-07-01), None

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