Coating and developing apparatus and coating and developing...

Details Coating and developing apparatus and coating and developing... Coating and developing apparatus and coating and developing...

2008-01-29

2008-01-29

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C427S240000, C118S052000

Reexamination Certificate

active

11239403

ABSTRACT:
A coating and developing apparatus comprises a process block which forms a resist film on a wafer, then transfers the wafer to an exposure apparatus, and performs a developing process on the wafer after exposure, and an interface transfer mechanism provided between the process block and the exposure apparatus. The process block includes unit blocks for coating-film formation and unit blocks for development laid out in a stacked manner. When an abnormality occurs in the interface transfer mechanism, an ordinary process in the unit block for coating-film formation is performed on those substrates which are present in that unit block for coating-film formation, after which processed wafers are retreated to a retaining unit and transfer of any wafer into the unit block for coating-film formation is inhibited.

REFERENCES:
patent: 5943880 (1999-08-01), Tateyama
patent: 5970717 (1999-10-01), Tateyama
patent: 6261007 (2001-07-01), Takamori et al.
patent: 6264381 (2001-07-01), Ueda
patent: 6402400 (2002-06-01), Ueda et al.
patent: 6471422 (2002-10-01), Ueda et al.
patent: 2001-176792 (2001-06-01), None
patent: 2004-193597 (2004-07-01), None

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