Coating a substrate by glow discharge graft polymerization

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204165, B05D 306

Patent

active

041316916

ABSTRACT:
A method of coating a substrate in an electrical discharge plasma, which comprises establishing a zone of electrical glow discharge plasma in a gaseous medium comprising at least about 25%, by weight, of water vapor, based on the total weight of the gaseous medium, and exposing said substrate to said plasma in said zone then exposing the substrate to an ethylenically unsaturated monomer whereby the monomer is grafted onto the substrate.

REFERENCES:
patent: 3600122 (1971-08-01), Coleman
patent: 3944709 (1976-03-01), Levy
patent: 3959104 (1976-05-01), Fales
patent: 3968270 (1976-07-01), Hasegawa
patent: 4072769 (1978-02-01), Lidel

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coating a substrate by glow discharge graft polymerization does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating a substrate by glow discharge graft polymerization, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating a substrate by glow discharge graft polymerization will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1128832

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.