Coater/developer and coating/developing method

Details Coater/developer and coating/developing method Coater/developer and coating/developing method

2004-12-16

2010-02-23

Mathews, Alan A (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C118S052000, C134S095300, C134S144000

Reexamination Certificate

active

07665916

ABSTRACT:
Accurate coating and developing having high intrasurface uniformity is achieved by suppressing the influence of components of a resist that may be eluted while a substrate coated with the resist is processed by immersion exposure. A coating unit coats a surface of a substrate with a resist. then, a first cleaning means including a cleaning nozzle cleans the substrate and then the substrate is subjected to an exposure process. Since only a small amount of components of the resist dissolves in a transparent liquid layer formed on the substrate for exposure, an exposure process can form lines in accurate line-widths. Consequently, a resist pattern of lines having accurate line-widths having high intrasurface uniformity can be formed on the substrate by developing the exposed resist.

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English translation of JP 10-303114 (dated Nov. 13, 1998).
English translation of JP 2004-095705 (dated Mar. 25, 2004).

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