Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1977-12-20
1980-02-26
Steiner, Arthur J.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
176 88, 204 38S, 428663, 428665, 428680, 428926, B32B 1500
Patent
active
041904931
ABSTRACT:
A protective layer of tungsten or molybdenum is tightly adhered via an intermediate layer of pure nickel to a substratum of nickel-base alloy containing a carbide-former. The protected substratum is used in the structural components for a helium cooling circuit of a high temperature nuclear reactor. The protective layer is of a thickness of from 0.5 to 0.2 millimeters while the intermediate layer is of a thickness of 0.01 to 0.05 millimeters.
REFERENCES:
patent: 2815299 (1957-12-01), Raymond
patent: 3474010 (1969-10-01), McMullen et al.
patent: 3597172 (1971-08-01), Bunghardt et al.
patent: 3647517 (1972-03-01), Milidantri et al.
patent: 4002782 (1977-01-01), Warner et al.
Steiner Arthur J.
Sulzer Brothers Limited
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