Coating apparatus – Gas or vapor deposition
Patent
1995-07-25
1996-10-08
Bueker, Richard
Coating apparatus
Gas or vapor deposition
118728, 118500, 156345, 29 2501, 211 41, 206454, C03C 1722, C23C 1630
Patent
active
055627749
ABSTRACT:
Quartz glass component having a coating with a silicon carbide surface includes a gradient layer of silicon carbide and at least one additional constituent which is less hard and has a lower modulus of elasticity than silicon carbide and whose concentration decreases across the thickness of the layer from inside to outside. The coated component has good thermal-shock resistance and long-term stability in terms of its chemical resistance to hydrofluoric acid and nitric acid as well as to a mixture of these two acids.
Breidenbach Poul E.
Hellmann Dietmar
Leber Helmut
Bueker Richard
Heraeus Quarzglas GmbH
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