Abrasive tool making process – material – or composition – Impregnating or coating an abrasive tool
Patent
1986-10-16
1988-04-19
Lieberman, Paul
Abrasive tool making process, material, or composition
Impregnating or coating an abrasive tool
51293, 51309, B24D 302
Patent
active
047386894
ABSTRACT:
Disclosed is an improved polycrystalline compact of self-bonded diamond particles having a network of interconnected empty pores dispersed throughout. The improved porous polycrystalline diamond compact possesses enhanced oxidation resistance and comprises all of the exterior surfaces of the porous compact being enveloped with a continuous coating which is effective under metal bond fabrication conditions so that oxidation of the diamond in the compact does not exceed a threshold level whereat loss of diamond properties of the compact occurs. Metal bond fabrication conditions comprehend an atmosphere containing oxygen or water vapor. Metal coatings are preferred, especially in coating thicknesses in excess of about 8 microns, and applied by a chemical vapor deposition process.
REFERENCES:
patent: 3520667 (1970-07-01), Taylor
patent: 3650714 (1972-03-01), Farkas
patent: 3879901 (1975-04-01), Caveney
patent: 3929432 (1975-12-01), Caveney
patent: 3984214 (1976-10-01), Pratt et al.
patent: 4112631 (1978-09-01), Howard
patent: 4142869 (1979-03-01), Vereschagin et al.
patent: 4399167 (1983-08-01), Pipkin
patent: 4505720 (1985-03-01), Gabor et al.
patent: 4606738 (1986-08-01), Hayden
Gigl Paul D.
Hammersley Bonnie M.
Slutz David E.
General Electric Company
Lieberman Paul
Thompson Willie J.
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