Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2006-05-16
2006-05-16
Hail, III, Joseph J. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S060000, C451S287000, C451S288000, C451S446000, C051S307000, C051S308000, C051S309000
Reexamination Certificate
active
07044836
ABSTRACT:
The invention provides a method of polishing a substrate, which method comprises the steps of (i) providing a polishing composition, (ii) providing a substrate comprising at least one metal layer, and (iii) abrading at least a portion of the metal layer with the polishing composition to polish the substrate. The polishing composition comprises an abrasive and a liquid carrier, wherein the abrasive comprises metal oxide particles having a surface with a silane compound adhered to a portion thereof and a polymer adhered to the silane compound and wherein the polymer is selected from the group consisting of water-soluble polymers and water-emulsifiable polymers. The invention also provides a polishing composition as described above, wherein the total amount of abrasive particles present in the polishing composition is no greater than about 20% by weight of the polishing composition, and the metal oxide particles do not comprise zirconia.
REFERENCES:
patent: 4563483 (1986-01-01), Smith et al.
patent: 4665116 (1987-05-01), Kornhaber et al.
patent: 5226930 (1993-07-01), Sasaki
patent: 5645736 (1997-07-01), Allman
patent: 5767016 (1998-06-01), Muroyama
patent: 5861055 (1999-01-01), Heidel et al.
patent: 6372648 (2002-04-01), Hall et al.
patent: 6656241 (2003-12-01), Hellring et al.
patent: 2002/0003225 (2002-01-01), Hampden-Smith et al.
patent: 1 020 488 (2000-07-01), None
patent: 1020488 (2000-07-01), None
patent: 1 104 778 (2001-06-01), None
patent: WO 01/04226 (2001-01-01), None
Lightle Ethan K.
Lu Bin
Sun Fred F.
Wang Shumin
Cabot Microelectronics Corporation
Hail III Joseph J.
Koszyk Frank
Lanning Robert
McDonald Shantese L.
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