Coated mask for photolithographic construction of electric circu

Stock material or miscellaneous articles – Structurally defined web or sheet – Including aperture

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20419226, 20419215, 427 35, 427143, 427282, 428131, 428134, 428457, 428698, 428704, 430 5, B32B 310, B05D 306, G03F 900

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active

048031100

ABSTRACT:
A mask for deposition of electrically-conductive paste material on a ceramic base, in the construction of electric circuits having multiple electronic chips is formed of molybdenum with a titanium nitride coating. The coating passes through apertures of a mesh on one side of the mask and continues through the apertures to appear in cutouts of stencils along the opposite side of the mask. Other elements of the fourth group of the periodic table, such as zirconium, may be employed in lieu of the titanium in the formation of the coating. The coating is uniformly applied by a sputtering procedure in which nitrogen is sprayed uniformly along the mask and away from a titanium target. In an argon plasma, the nitrogen and the titanium are sputtered onto the molybdenum where the titanium and nitrogen combine to form the coating.

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Levine et al, "Inspection in the Third Dimension:Metal Mack Inspection Problems High-Performance Multilayer Ceramic Package", Spie-Integrated Circuit Metrology, vol. 342, 1982, pp. 44-52.

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