Coat/develop module with independent stations

Details Coat/develop module with independent stations Coat/develop module with independent stations

2007-08-14

2007-08-14

Tadesse, Yewebdar (Department: 1734)

Coating apparatus

Projection or spray type

Moving projector

C118S052000, C118S666000, C118S326000

Reexamination Certificate

active

11111154

ABSTRACT:
An apparatus for dispensing fluid during semiconductor substrate processing operations. The apparatus includes a first processing chamber, a second processing chamber, and a dispense arm assembly. The apparatus further includes a dispense arm access shutter positioned between the first and second processing chambers and moveable between an open and a closed position. The dispense arm assembly can travel from the first processing chamber to the second processing chamber when the dispense arm assembly is in the open position. In an alternative embodiment, the apparatus also includes a central fluid dispense bank between the first and second processing chambers and a second dispense arm access shutter positioned between the first and second processing chambers, wherein the dispense arm access shutter is positioned between the first processing chamber and the central fluid dispense bank and the second dispense arm access shutter is positioned between the central fluid dispense bank and the second processing chamber.

REFERENCES:
patent: 5250114 (1993-10-01), Konishi et al.
patent: 5960225 (1999-09-01), Fujimoto
patent: 6258167 (2001-07-01), Kawano et al.
patent: 6616762 (2003-09-01), Inada et al.
patent: 6736556 (2004-05-01), Kanagawa
patent: 2006/0130747 (2006-06-01), Ishikawa et al.
patent: 05003151 (1993-01-01), None
English Translated Abstract of JP 05003151A.
English Translated Abstract and Drawing KR2004013965A.

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