Co-Cr-Pt-B alloy sputtering target

Details Co-Cr-Pt-B alloy sputtering target Co-Cr-Pt-B alloy sputtering target

2011-04-19

2011-04-19

Wyszomierski, George (Department: 1733)

Metal treatment

Stock

Cobalt base

C204S298130, C420S436000

Reexamination Certificate

active

07927434

ABSTRACT:
Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 μm or less. This Co—Cr—Pt—B alloy sputtering target has an uniform and fine rolled structure with minimal segregation and residual stress upon casting, and the present invention aims to enable the stable and inexpensive manufacture of the target, prevent or suppress the generation of particles, and to improve the production yield of deposition.

REFERENCES:
patent: 4832810 (1989-05-01), Nakamura et al.
patent: 4908727 (1990-03-01), Ezaki et al.
patent: 5352501 (1994-10-01), Miyamoto et al.
patent: 5468305 (1995-11-01), Uchida et al.
patent: 6521062 (2003-02-01), Bartholomeusz et al.
patent: 6599377 (2003-07-01), Bartholomeusz et al.
patent: 2007/0125645 (2007-06-01), Nakamura et al.
patent: 2007/0209547 (2007-09-01), Irumata et al.
patent: 2000-096220 (2000-04-01), None
patent: 2001-026860 (2001-01-01), None
patent: 2002-069623 (2002-03-01), None
patent: 2002-208125 (2002-07-01), None
Full human translation of JP 2002-069623, Ueno et al, published Mar. 2002, 26 pages.
Full human translation of JP 2001-026860, Ueno et al, published Jan. 2001, 33 pages.
English translation of JP 2002-208125 to Tomonori Ueno et al., published Jul. 26, 2002, 22 pages.
Esp@cenet database, one page English Abstract of JP 2002-069625, Mar. 2002.

Affiliated with

Also associated with

Rating

Co-Cr-Pt-B alloy sputtering target does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Co-Cr-Pt-B alloy sputtering target, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Co-Cr-Pt-B alloy sputtering target will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2622213