Electric lamp and discharge devices – Discharge devices having an electrode of particular material
Reexamination Certificate
2007-01-09
2007-01-09
Santiago, Mariceli (Department: 2879)
Electric lamp and discharge devices
Discharge devices having an electrode of particular material
C313S309000, C313S310000, C313S351000, C445S050000, C445S051000, C423S447100, C423S447200, C977S742000, C977S753000, C977S842000, C977S844000, C977S939000
Reexamination Certificate
active
10432126
ABSTRACT:
A fabrication method for an emitter includes the steps of forming on a glass substrate a CNT film which contains a plurality of carbon nanotubes (CNTs) and constitutes an emitter electrode, forming a gate electrode via an insulating film on the CNT film, forming a plurality of gate openings in the gate electrode and the insulating film, and aligning upright the CNTs in the gate opening. The upright alignment generates a stable uniform emission current and provides excellent emission characteristics.
REFERENCES:
patent: 6057637 (2000-05-01), Zettl et al.
patent: 6149775 (2000-11-01), Tsuboi et al.
patent: 6250984 (2001-06-01), Jin et al.
patent: 6616495 (2003-09-01), Tsuboi
patent: 1020888 (2000-07-01), None
patent: 6-162919 (1994-06-01), None
patent: 8-264109 (1996-10-01), None
patent: 2000-86216 (2000-03-01), None
patent: 2000-90809 (2000-03-01), None
patent: 2000-311578 (2000-11-01), None
patent: 2001-35362 (2001-02-01), None
patent: 2001-319560 (2001-11-01), None
Ito Fuminori
Konuma Kazuo
Okada Yuko
Okamoto Akihiko
Tomihari Yoshinori
Muirhead and Saturnelli LLC
NEC Corporation
Santiago Mariceli
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