Abrasive tool making process – material – or composition – With inorganic material – Clay – silica – or silicate
Reexamination Certificate
2011-05-17
2011-05-17
Green, Anthony J (Department: 1731)
Abrasive tool making process, material, or composition
With inorganic material
Clay, silica, or silicate
C051S307000, C252S079100, C252S079200, C252S079400, C106S003000
Reexamination Certificate
active
07942945
ABSTRACT:
The proposed slurry can be used to planarize polymeric candidate ILD materials such Benzocylobutene (BCB), SILK, Polyimide, etc. The slurry consists of colloidal suspension of nanoparticle abrasives made up of Tetraethylorthosilicate (TEOS)-derived silica and Zirconium-dioxide (ZrO2), its derivatives and any materials modified from ZrO2and/or TEOS, in a chemically active medium. The base solution of the slurry consists of deionized (Dl) water, buffering agents like inorganic buffer comprised of inorganic acids such as TRIS-Hcl, its derivatives and variants, cleansing agents, surface modified catalysts, and surface reagents. The organic solvents like isopropyl alcohol, methanol, and other organic alcohols ranging from 0.0005 to 0.05% are employed for active dissolution of the chemical surface complex formed as a result of the slurry chemical action. The inorganic buffer is so chosen that the complex salts resulting from the reaction impart hydrophobicity to the polished thin film surface. The advantages of hydrophobicity include: a) reduced particle adhesion on surface, b) less intensive post-CMP clean, c) no surface degradation or contamination, etc.
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Kumar Arun
Kumar Ashok
Zantye Parshuram B.
Green Anthony J
Lawson Michele L.
Parvini Pegah
Robert Varkonyi Smith & Hopen, P.A.
University of South Florida
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