CMP porous pad with component-filled pores

Details CMP porous pad with component-filled pores CMP porous pad with component-filled pores

2007-03-27

2007-03-27

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S285000

Reexamination Certificate

active

10807064

ABSTRACT:
The invention provides a polishing pad comprising a polymeric material having pores and a component that is disposed within the pores, as well as a method of polishing a workpiece with the aforesaid polishing pad, and a method for producing the aforesaid polishing pad.

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