CMP composition containing organic nitro compounds

Details CMP composition containing organic nitro compounds CMP composition containing organic nitro compounds

2006-02-14

2006-02-14

Norton, Nadine G. (Department: 1765)

Compositions

Etching or brightening compositions

C252S079400, C438S692000

Reexamination Certificate

active

06998066

ABSTRACT:
The use of organic nitro compounds, such as nitrobenzene sulfonic acids, in chemical mechanical polishing compositions is disclosed. Chemical mechanical polishing slurries are widely used in polishing and planarizing silicon wafers and other fine surfaces. Inorganic nitro compounds are widely used in these slurries as oxidant sources. However, organic nitro compounds, particularly aromatic nitro compounds, are here suggested as advantageous substitutes.

REFERENCES:
patent: 5403721 (1995-04-01), Ward et al.
patent: 2002/0016073 (2002-02-01), Kondo et al.
patent: 60032898 (1985-02-01), None
Central Glass Co Ltd. [CENG], Water-in-oil emulsion detergent composition for machine parts- . . . also nitro:alkane and benzazole derivative, English Abstract of JP 60032898, Aug. 2, 1983, 2 pages.

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