Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Patent
1995-02-22
1996-06-18
Limanek, Robert P.
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
257369, 257351, 257372, 257 66, 257401, H01L 2976
Patent
active
055280560
ABSTRACT:
A thin-film semiconductor device having a CMOS inverter comprising a pair of n-type and p-type thin-film transistors, wherein the gate electrode of at least one of the paired thin-film transistors comprises a plurality of gate electrode sections spaced apart along the channel length. The channel region of the n-type thin-film transistor is doped with p-type impurities. This structure serves to reduce the leakage current and maintain high OFF resistance for a high source-drain voltage. Further, since a good symmetry of characteristics is maintained between the n-type and p-type thin-film transistors that constitute the CMOS inverter, no appreciable bias is caused in the output voltage of the CMOS inverter.
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Matsushima Yasuhiro
Shimada Takayuki
Takafuji Yutaka
Yamashita Toshihiro
Yoshimura Yoji
Hardy David B.
Limanek Robert P.
Sharp Kabushiki Kaisha
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