Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
Patent
1998-11-09
2000-09-12
Mintel, William
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Charge transfer device
257233, 257292, 257294, 257436, 257446, 438 60, 438 69, 438 75, H01L 27148, H01L 29768
Patent
active
061181420
ABSTRACT:
A CMOS sensor structure and method of manufacture that includes the fabrication of a special shallow trench isolation structure. Besides isolating the active region for forming the CMOS sensor device, the shallow trench isolation structure has a special reflective plug embedded inside capable of reflecting incoming light onto the sensitive region of the CMOS sensor. Hence, the interactive length of incoming light with the light sensitive region can be increased, thereby increasing the contrast ratio and light sensitivity of the CMOS sensor.
REFERENCES:
patent: 4450466 (1984-05-01), Nishizawa et al.
patent: 5578842 (1996-11-01), Shinji
patent: 5825071 (1998-10-01), Takakura
patent: 5942775 (1999-08-01), Yiannoulos
patent: 6026964 (2000-03-01), Hook et al.
Chen Ming-I
Fan Yung-Chieh
Mintel William
United Microelectronics Corp.
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