CMOS process polysilicon strip loaded waveguides with a two...

Optical waveguides – Planar optical waveguide

Reexamination Certificate

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C385S130000, C385S131000, C385S132000

Reexamination Certificate

active

07136563

ABSTRACT:
A standard CMOS process is used to fabricate optical, optoelectronic and electronic devices at the same time on a monolithic integrated circuit. A polysilicon strip loaded waveguide is used as an example to illustrate the invention. The waveguide has a two layer core made of a polysilicon strip on a silicon slab. In a standard CMOS process, a layer of metallic salicide is deposited for metallic contacts for electronic components, such as transistors. In the present invention, prior to the deposition of the salicide, a salicide blocking layer is selectively deposited for protecting silicon waveguide against damages. The salicide blocking layer is used as one layer of the cladding of a silicon waveguide.

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