CMOS memory cell array

Fishing – trapping – and vermin destroying

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437 43, 437 48, 437 69, 437 70, H01L 2170

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active

053507061

ABSTRACT:
A CMOS memory cell array and a method of forming it, which avoids problems caused by field oxide corner-rounding. A moat pattern defines alternating columns of active areas and field oxide regions. A source line pattern defines rows of source lines. Silicon dopant is implanted in areas not covered by the source line pattern to form buried n+ source lines. The field oxide regions are formed in areas not covered by the moat pattern. Subsequent fabrication steps may be in accordance with conventional CMOS fabrication techniques.

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patent: 5019527 (1991-05-01), Ohshima et al.
patent: 5045489 (1991-09-01), Gill et al.
patent: 5081056 (1992-01-01), Mazzali et al.
patent: 5120671 (1992-06-01), Tang et al.

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