CMOS imager with enhanced transfer of charge and low voltage...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Reexamination Certificate

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Details

C257S066000, C257S121000, C257S291000, C257SE31084, C438S066000, C438S073000, C438S174000, C438S276000

Reexamination Certificate

active

07385232

ABSTRACT:
A dopant gradient region of a first conductivity type and a corresponding channel impurity gradient below a transfer gate and adjacent a charge collection region of a CMOS imager photodiode are disclosed. The channel impurity gradient in the transfer gate provides a complete charge transfer between the charge collection region of the photodiode and a floating diffusion node. The dopant gradient region is formed by doping a region at one end of the channel with a low enhancement dopant and another region at the other end of the channel with a high enhancement dopant.

REFERENCES:
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patent: 5668390 (1997-09-01), Morimoto
patent: 6489643 (2002-12-01), Lee et al.
patent: 6504193 (2003-01-01), Ishiwata et al.
patent: 6521926 (2003-02-01), Sasaki
patent: 6570201 (2003-05-01), Shim
patent: 6661459 (2003-12-01), Koizumi et al.
patent: 6744084 (2004-06-01), Fossum
patent: 7078745 (2006-07-01), Patrick

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