CMOS device with both p+ and n+ gates

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357 42, 357 59, 357 71, U01C 21283

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048901415

ABSTRACT:
A CMOS device wherein the N-channel devices have n+ gates, and the P-channel devices have p+ gates. A TiN local interconnect system is used to connect the two types of gates, as well as providing connections to moat.

REFERENCES:
patent: 3879746 (1975-04-01), Fournier
patent: 4392150 (1983-07-01), Courreges
patent: 4502209 (1985-03-01), Eizenberg et al.
patent: 4593454 (1986-06-01), Baudrant et al.
patent: 4605947 (1986-08-01), Price et al.
patent: 4675715 (1987-06-01), Lepselter et al.
patent: 4677735 (1987-07-01), Malhi
Alperin et al., "Development of the Self-Aligned Titanium Silicide Process for VLSI Applications", IEEE Trans. on Electron Devices, vol. EO-32, No. 2, Feb. 1985, pp. 141-149.
V. L. Rideout, "Method of Fabricating MOSFET Integrated Circuits with Low Resistivity Interconnection Lines", IBM Technical Disclosure, vol. 23, No. 6, Nov. 1980, pp. 2563-2566.
F. H. De La Moneda, "Self-Aligned Silicide Buried Contacts", IBM Technical Disclosure, vol. 24, No. 7A, Dec. 1981, pp. 3454-3457.
P. J. Tsang, "Forming Thick Metal Silicide for Contact Barrier", IBM Technical Disclosure, vol. 19, No. 9, Feb. 1977, pp. 3383-3385.
H. Kaneko et al., "Novel Submicron MOS Devices by Self-Aligned Nitridation of Silicide (Sanicide)", IEDM, '85, pp. 208-211.

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