Cluster generator

Details Cluster generator Cluster generator

2011-05-31

2011-05-31

Nguyen, Nam X (Department: 1724)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298090, C204S298140

Reexamination Certificate

active

07951276

ABSTRACT:
Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.

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Milani, P.; Piseri, P.; Barborini, E.; Podesta, A.; Lenardi, C. “Cluster Beam Synthesis of Nanostructured Thin Films”;J. Vac. Sci. Technol. A, 2001, 19:4, 2025-2033.

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