Cluster beam targets for laser plasma extreme ultraviolet and so

Details Cluster beam targets for laser plasma extreme ultraviolet and so Cluster beam targets for laser plasma extreme ultraviolet and so

1995-01-25

1996-11-19

Porta, David P.

X-ray or gamma ray systems or devices

Source

378143, H01J 3526

Patent

active

055770924

ABSTRACT:
Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.

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Fiedorowicz, H. et al. Proceedings of the Thirteenth International Congress, UMIST, Aug. 31-Sep. 4, 1992; pp. 515-518 "Laser Plasma X-Ray Source with a Gas Puff Target".
McPherson, A. et al. Applied Physics B v. 57; pp. 337-347 (1993) "Multiphoton-Induced X-Ray Emission and Amplification from Clusters".
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Inoue, T. et al. Journal of Chemical Physics v. 92 (1): pp. 162-169 (1989) "Formation of Water Clusters in a Free Molecular Jet of Binary Mixtures".

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