Cluster beam deposition method for manufacturing thin film

Details Cluster beam deposition method for manufacturing thin film Cluster beam deposition method for manufacturing thin film

1994-11-04

1996-12-10

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

4271261, 4271263, 427109, 427166, C23C 1424

Patent

active

055828795

ABSTRACT:
In a method of manufacturing a thin film, evaporated particles are generated by a vapor source and are clustered. The clustered evaporated particles are deposited onto a substrate in a vacuum atmosphere without ionizing the particles. A partial pressure of water in the vacuum atmoshpere is controlled to not more than 5.times.10.sup.-6 Torr. A temperature of the substrate is maintained to be 150.degree. C. or lower. A film according to this method has a high adhesion characteristics and a high mechanical strength without heating the substrate to a high temperature and without damaging the substrate by ions.

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