Closing disk for immersion head

Details Closing disk for immersion head Closing disk for immersion head

2007-10-23

2007-10-23

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000

Reexamination Certificate

active

11114566

ABSTRACT:
A closing disk for an immersion head of an immersion lithography system is disclosed. The closing disk makes contact with the immersion head at the edges of the closing disk, but not the center, preventing damage to the bottom surface of the immersion head and also to the closing disk. The closing disk may be transparent or opaque, and may be aligned to the immersion head using optical or mechanical alignment.

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patent: 2005/0046813 (2005-03-01), Streefkerk, et al.
patent: 1 420 299 (2004-05-01), None
patent: 1 647 865 (2006-04-01), None
“193 nm Immersion Lithography Rated Suitable for Fab Evaluation, Participants at International Sematech Conference Told,” downloaded Apr. 20, 2005, pp. 1-4, Sematech, Inc., http://www.sematech.org/corporate
ews/releases/20040127.htm.
“ASML leads the market with immersion lithography,” downloaded Apr. 20, 2005, pp. 1-2, ASML, http://www.asml.com/NASApp/asmldotcom/printfriendly.do?ctx=168&rid=10668.
Geppert, L., “Chip Making's Wet New World,” IEEE Spectrum, downloaded Apr. 20, 2005, pp. 1-8, IEEE, http://www.spectrum.ieee.org/WEBONLY/publicfeature/may04/0504lith.html.
“Technology Backgrounder: Immersion Lithography,” downloaded Apr. 20, 2005, pp. 1-5, IC Knowledge, http://www.icknowledge.com/misc—technology/Immersion%20Lithography.pdf.

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