Closed-loop sputtering system and method of operating same

Details Closed-loop sputtering system and method of operating same Closed-loop sputtering system and method of operating same

1978-06-26

1980-05-06

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

042016452

ABSTRACT:
A closed-loop sputtering system for the deposition of thin films which includes a control means to maintain and control the voltage of the target electrode by control of the flow of gas to the plasma without measurement of the pressure of the system.

REFERENCES:
patent: 4043889 (1977-08-01), Kochel
patent: 4115184 (1978-09-01), Poulsen
Pressure Control of RF Bias for Sputtering, L. J. Kochel; Rev. Sci. Instrum., vol. 47, No. 12, Dec., 1976, pp. 1556-1557.

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