Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2005-08-02
2005-08-02
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S121000
Reexamination Certificate
active
06925346
ABSTRACT:
Multiple criteria are monitored and controlled to enhance the success of direct-metal deposition, including greater control over factors such as deposit layer height/thickness, sub-harmonic vibration, contour path shape, powder mass flow, and deposition speed, and stress accumulation. Sensors are used to monitor some or all of the following parameters during the deposition process: deposit height, width, temperature, and residual stress. A predetermined limit with respect to the yield strength of the material is preferably set. If the stress exceeds that limit sensors will automatically introduce one or more remedial measures, the priority of which is established using a look-up table generated in accordance with prior experimental knowledge. To control temperature induced distortion and stress, an infrared temperature detector may be used in conjunction with a controller to reduce temperature, increase speed and decreased power for purpose of stress management.
REFERENCES:
patent: 4323756 (1982-04-01), Brown et al.
patent: 4724299 (1988-02-01), Hammeke
patent: 5247155 (1993-09-01), Steen et al.
patent: 5659479 (1997-08-01), Duley et al.
patent: 5837960 (1998-11-01), Lewis et al.
patent: 5966312 (1999-10-01), Chen
patent: 5985056 (1999-11-01), McCay et al.
patent: 6013915 (2000-01-01), Watkins
patent: 6046426 (2000-04-01), Jeantette et al.
patent: 6122564 (2000-09-01), Koch et al.
patent: 6268584 (2001-07-01), Keicher et al.
patent: 6314214 (2001-11-01), Walter et al.
patent: 6323951 (2001-11-01), Borden et al.
patent: 6363294 (2002-03-01), Coronel et al.
patent: 1340583 (2002-02-01), None
Kelly Joseph K.
Mazumder Jyoti
Gifford Krass Groh Sprinkle Anderson & Citkowski PC
Picard Leo
Rapp Chad
LandOfFree
Closed-loop, rapid manufacturing of three-dimensional... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Closed-loop, rapid manufacturing of three-dimensional..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Closed-loop, rapid manufacturing of three-dimensional... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3490772