Heating – Processes of heating or heater operation – Including apparatus purging – cleaning or accretion preventing
Patent
1991-01-17
1992-06-02
Yuen, Henry C.
Heating
Processes of heating or heater operation
Including apparatus purging, cleaning or accretion preventing
432 5, 432 11, 432 41, 432 57, 432253, F27D 1900
Patent
active
051182866
ABSTRACT:
Mixing of spent reactant gases with ambient air inside a semiconductor wafer fabrication facility is avoided and consequently corrosion of a scavenger box in a wafer fabrication facility is avoided. Repeatability of reaction gas results on wafers in a process tube is improved by maintaining precisely constant pressure in the wafer processing tube, which is operated close to ambient atmospheric pressure. This is accomplished by positioning an exhaust tube downstream from the wafers in the processing tube at a location that results in a uniform, repeatable reaction gas flow pattern between the wafers. Pressures at or near that point are measured by a differential manometer referenced to ambient atmospheric pressure to produce a pressure-indicating signal. The pressure indicating signal is electronically compared with a preset constant signal representative of the desired constant pressure at the pressure measurement point to produce an error signal. The error signal is used to continuously vary the position of an exhaust valve in the exhaust tube and thereby maintain the measured pressure constant despite variations in ambient atmospheric pressure and variations in an exhaust gas scrubber system coupled to the exhaust tube.
REFERENCES:
patent: 4351805 (1982-09-01), Reisman et al.
patent: 4955808 (1990-09-01), Miyagawa
patent: 4992044 (1991-02-01), Philipossian
Amtech Systems
Yuen Henry C.
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