Closed container to be used in a clean room

Details Closed container to be used in a clean room Closed container to be used in a clean room

1993-04-05

1994-06-14

Sewell, Paul T.

Special receptacle or package

Including ancillary article contacting medium

Gas medium

206454, 211 41, 118500, 141 98, 141 67, 414935, B65B 104, H01L 2100

Patent

active

053202180

ABSTRACT:
A wafer storing, closed container for use in a clean room of a semiconductor manufacturing system is provided with an attached inert gas tank so as to eliminate the need to convey the container to an inert gas purge station to supplement the inert gas supply in the container due to leakage. A gas passageway is formed in a body of the container in such a manner that one end thereof is open inside the container. The other end is open outside the container. The portable inert gas tank is detachably connected to the other end of the gas passageway so as to automatically supplement the container with the inert gas.

REFERENCES:
patent: 4724874 (1988-02-01), Parikh et al.
patent: 4797054 (1989-01-01), Arii
patent: 4920920 (1990-05-01), Shigeki
patent: 5074736 (1991-12-01), Ishii

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