Gas separation – Residue access – handling or removing means – With means effecting or assisting discharge of residue
Patent
1997-05-16
1999-08-10
Bushey, C. Scott
Gas separation
Residue access, handling or removing means
With means effecting or assisting discharge of residue
55522, 55523, 96262, 96326, 96327, 96355, 96372, 2611121, 406 46, 406 48, 406193, B01D 3500, B01D 5100, B65G 5318
Patent
active
059352833
ABSTRACT:
A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-Forming gas stream to a gas processing system. The structure is composed of a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween. The clog-resistant inlet structure is constructed, arranged, and operated so as to introduce a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.
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Arya Prakash V.
Holst Mark
Lane Scott
Sweeney Joseph D.
ATMI Ecosys Corporation
Bushey C. Scott
Hultquist Steven J.
Zitzmann Oliver A.M.
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