Cleaning system using acrylic emulsion for semiconductor wafers

Details Cleaning system using acrylic emulsion for semiconductor wafers Cleaning system using acrylic emulsion for semiconductor wafers

1994-10-03

1996-01-16

Spisich, Mark

Brushing, scrubbing, and general cleaning

Machines

For fruit, vegetables, meat or eggs

134902, B08B 102, B08B 302, B08B 704

Patent

active

054837170

ABSTRACT:
A cleaning apparatus has a roller unit coated with an adhesive layer formed from acrylic emulsion for eliminating contaminants from a surface of a semiconductor wafer and a washing unit for washing away a piece of adhesive substance left on the surface of the semiconductor wafer, and the adhesive layer formed from acrylic emulsion is so large in tackiness and hydrophilic that the cleaning apparatus removes not only large but also micro particles without residue of the adhesive substance on the surface of the semiconductor wafer.

REFERENCES:
patent: 2937390 (1960-05-01), Bolton et al.
patent: 3079619 (1963-03-01), Conrose
patent: 3839952 (1974-09-01), Mogford
patent: 3914817 (1975-10-01), Lindsay
patent: 4009047 (1977-02-01), Lindsay
patent: 4982469 (1991-01-01), Nishiwaki
patent: 5138390 (1992-08-01), Miyabayashi et al.
patent: 5198292 (1993-03-01), Lerner et al.
Partial translation of Japanese Patent Publication of Unexamined Application No. 63-204728.

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